Diffusion, Ion Implantation, and Annealing Process at N2FC, NTU
From ion implantation to furnace diffusion and annealing process, N2FC offers integrated capabilities to precisely control doping profiles and optimize device performance.
Supporting both research and industry with reliable, high-quality processes—turning ideas into functional technologies.
NTU N2FC
Advanced Semiconductor Processing Facility
Thin Film | Diffusion | Dry Etch | Lithography
Metrology | Wet Bench | Dicing & Packaging
At Nanyang NanoFabrication Centre (N2FC), we enable cutting-edge research through advanced lithography capabilities that support precise micro- and nanoscale patterning.
Our platforms support a wide range of processes, including high-resolution pattern definition, rapid prototyping, and process development—serving applications in semiconductors, photonics, and emerging nanotechnologies.
From concept to fabrication, N2FC empowers researchers and industry partners to transform innovative ideas into functional devices with accuracy and reliability.
N2FC (Nanyang NanoFabrication Centre) at NTU is a advanced cleanroom facility that serves as core infrastructure enabling frontier research and innovation across a broad spectrum of technologies.
Here’s a short video highlighting N2FC’s current equipment. Exciting new additions are on the way in the coming months—stay tuned!
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Location
Category
Website
Address
Singapore
639798
Opening Hours
| Monday | 08:30 - 22:00 |
| Tuesday | 08:30 - 22:00 |
| Wednesday | 08:30 - 22:00 |
| Thursday | 08:30 - 22:00 |
| Friday | 08:30 - 22:00 |
| Saturday | 08:30 - 22:00 |
| Sunday | 08:30 - 22:00 |